Thin film and nanostructure growth (@ Camilla Baratto)

The material preparation lab has facilities for thin film deposition (RF-sputtering) and chemical lab for preparation of nanostructures (hydrothermal growth).

  • RF and DC magnetron sputtering ; 3” targets; 1 RF position, 2 DC positions. Process gas: Ar, N2. 
  • Alpha IQ Step Profiler (Thickness measurement)
  • Oxidation furnaces
  • Plasma etching for surface modification (Colibrì)

Material characterization  (@ Camilla Baratto)

Morphological and spectroscopical characterization are available to characterize the material of interest.

  • Morphological characterization: FE-SEM Leo 1525, equipped with microanalysis, nanomanipulators, STEM
  • Fluorescence spectroscopy : LS55 Perkin-Elmer, light source Xenon, 200-900nm
  • IR Spectroscopy: FT-IR Spectrometer Bruker Vertex 70v. WL range: 370-7000 cm-1
  • Raman Spectroscopy: (@ DII – Prof. Guido Faglia) Horiba modular micro-Raman with single 320 f /4.1 monochromator+front illuminated CCD
    • Light excitation: 325 nm (PL only) / 442 nm /532 nm /785nmconfocal microscope; Micro-motorized x-y stage, 100 nm steps
    • PL (325nm) 40xUV, 50x LWD
    • Raman 10x; 100X
    • Accessories Linkam THMS 600 [-196°C-600°C]+ gas supply.

Gas sensing characterization (@ DII – Prof. G. Faglia)

  • Electrical gas sensing facility
  • Optical gas sensing facility, both in micro and macro configuration

Microbiological Lab (@Andrea Ponzoni)

Class II microbiological laboratory. Main facilities:

  • Microbiological Cap, class II: SAFEFAST classic 212
  • Autoclave

Electronic nose (@Andrea Ponzoni)

Commercial, potable platforms are available for the development of customized electronic noses for specific applications.

  • Electronic noses: commercial, portable paltforms (JLM moxstick equipped with commercial sensors) to work with metal oxide based gas sensors in temperature modulation mode
  • Autosampler: HTA HT280T for automatic measurements
  • Thermostatic chamber:  Angelantoni

Solar simulator