Thin film and nanostructure growth (@ Camilla Baratto)
The material preparation lab has facilities for thin film deposition (RF-sputtering) and chemical lab for preparation of nanostructures (hydrothermal growth).
- RF and DC magnetron sputtering ; 3” targets; 1 RF position, 2 DC positions. Process gas: Ar, N2.
- Alpha IQ Step Profiler (Thickness measurement)
- Oxidation furnaces
- Plasma etching for surface modification (Colibrì)
Material characterization (@ Camilla Baratto)
Morphological and spectroscopical characterization are available to characterize the material of interest.
- Morphological characterization: FE-SEM Leo 1525, equipped with microanalysis, nanomanipulators, STEM
- Fluorescence spectroscopy : LS55 Perkin-Elmer, light source Xenon, 200-900nm
- IR Spectroscopy: FT-IR Spectrometer Bruker Vertex 70v. WL range: 370-7000 cm-1
- Raman Spectroscopy: (@ DII – Prof. Guido Faglia) Horiba modular micro-Raman with single 320 f /4.1 monochromator+front illuminated CCD
- Light excitation: 325 nm (PL only) / 442 nm /532 nm /785nmconfocal microscope; Micro-motorized x-y stage, 100 nm steps
- PL (325nm) 40xUV, 50x LWD
- Raman 10x; 100X
- Accessories Linkam THMS 600 [-196°C-600°C]+ gas supply.
Gas sensing characterization (@ DII – Prof. G. Faglia)
- Electrical gas sensing facility
- Optical gas sensing facility, both in micro and macro configuration
Microbiological Lab (@Andrea Ponzoni)
Class II microbiological laboratory. Main facilities:
- Microbiological Cap, class II: SAFEFAST classic 212
Electronic nose (@Andrea Ponzoni)
Commercial, potable platforms are available for the development of customized electronic noses for specific applications.
- Electronic noses: commercial, portable paltforms (JLM moxstick equipped with commercial sensors) to work with metal oxide based gas sensors in temperature modulation mode
- Autosampler: HTA HT280T for automatic measurements
- Thermostatic chamber: Angelantoni